問題詳情
48. Which of the following is NOT suitable for LIGA process:
(A) resist materials must have high X-raysensitivity,
(B) microarc oxidation,
(C) resist materials can be removed or stripped,
(D) electroplating ofnickel, or
(E) all of the above?
參考答案
答案：[無官方正解]
難度：計算中-1
書單：沒有書單，新增